Proceedings of the Eleventh International Symposium on Plasma Processing

Proceedings of the Eleventh International Symposium on Plasma Processing

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It is also observed that the chamber pressure has the largest effect on the nitride etch rate a€” - a€” 5000 2.000 6000 2.000 ... In a separate experiment, given the same recipe but etched in the Applied Materials MxP clamp chamber, from which anbsp;...


Title:Proceedings of the Eleventh International Symposium on Plasma Processing
Author: Electrochemical Society. Electronics Division
Publisher:The Electrochemical Society - 1996-01-01
ISBN-13:

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